As Moore’s Law marches on, the need for increased process margin, particularly in depth of focus, is driving optical proximity correction (OPC) and inverse lithography technology (ILT) to create more ...
(Nanowerk News) Recently, researchers from the Shanghai Institute of Optics and Fine Mechanics (SIOM) of the Chinese Academy of Sciences (CAS) have proposed a source mask optimization (SMO) technique ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback