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Intel installs industry's first commercial high-NA EUV lithography tool — ASML Twinscan EXE:5200B sets the stage for 14A

B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV ...
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ASML’s Next-Generation Chipmaking Technology Reaches Critical Production Milestone

The Dutch semiconductor equipment giant ASML has achieved a significant breakthrough in bringing its next-generation ...